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Upright Metallurgical Microscope, LW200-3JT

RM9,000.00

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The LW200 series of upright metallographic microscopes are suitable for microscopic observation of opaque objects. The instrument is equipped with an epi-illuminator, a flat-field achromatic objective lens, a large-field eyepiece, clear image, good contrast, and a polarizing device. This series of products are used in factories, mines, universities and research institutions for the observation and inspection of the surface structure of metallographic, lithofacies and ore materials. It can also be used in the electronics, metallurgy, chemical and instrumentation industries to observe transparent, translucent or opaque materials such as cermets, electronic ceramics, manifolds, printed circuit boards, liquid crystal panels, films, fibers, coatings and others. Non-metallic materials are also suitable for observation and analysis by medicine, agriculture, forestry, public security, schools, and scientific research departments.

  

The main technical parameters: 

1.  Eyepiece tube: Trinocular axis, tilted at 30 degrees, including polarizer

2.  Eyepiece: large field of view WF10X (18mm) 

3.  Long-distance flat field achromatic objective lens:

PL5X/0.12 PL10X/0.25

PL L40X(S)/0.60 PL L60X(S)/0.75 (spring)

4.  The total magnification: 50X-600X

5.  Focusing mirror: adjustable Abbe focusing mirror NA1.25-hole mirror light filter

6.  Focusing: coarse and micromotion coaxial, lifting range 25mm micro-motion value 0.002mm coarse and elastic adjustable, with locking and limit device

7.  Lighting system: epi-illumination 6V20W, a halogen lamp, adjustable brightness, with the polarizer

8.  The stage: double-layer mechanical mobile (size: 185 × 140mm, moving range: 75 × 50mm)

9.  Transmission lighting system: concentrator, the halogen lamp is suitable. Blue filter and frosted glass.

 

Optional:

 

1. Eyepiece: WF16X/11mm, WF20X/9mm, 10X adjustable eyepiece with tape

2. Objective lens: PLAN20X, PLAN100X

3. Camera system: 5 million industrial CCD, digital camera 

4. Particle analysis software, measurement software, metallographic analysis software, etc.